TSMC to start using High-NA EUV lithography in 2030 — A10 or A11 technology prime candidates for use
TSMC has confirmed plans to adopt High-NA EUV lithography starting in 2030, initially with conventional 6x6-inch photomasks and later moving to 6x12-inch masks via a pilot line in 2031. The company did not specify which node will first use the technology, but A10 or A11 are considered strong candidates, and TSMC is working with ASML on the industry-wide transition.
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AI Curated(PR) TSMC and ASML Announce Initiative to Pioneer Industry Transition to Large-Format Photomasks for High NA EUV
TSMC and ASML announced a joint initiative to lead the industry transition to larger-format (12-inch) photomasks for High NA EUV lithography. The move aims to increase fab productivity, lower chipmaking costs, and remove stitching constraints, enabling more cost-effective future chip generations.
Mindfactory Data Shows 30% Jump In GPU Sales As Buyers Panic-Buy Ahead Of Another Looming Price Hike
Sales data from German retailer Mindfactory reportedly shows a 29.5% month-over-month increase in GPU sales in August, driven by buyers panic-buying ahead of possible price hikes. The Radeon RX 9070 XT remains the most popular GPU despite high prices. The article also cites Jon Peddie Research data showing a 10.4% quarterly increase in GPU shipments.
Intel CPUs are reportedly getting a 10 percent price hike in October
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NEC has quietly quit quantum computing hardware development, report claims — company says it will continue to evaluate practical applications and industrialization of quantum technologies
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